Editorial board

EDITOR

Phillip H. Geil
Department of Materials Science & Engineering
University of Illinois, 1304 West Green Street
Urbana, Illinois 61801, USA
telephone: (217) 333-0149, fax: (217) 333-2736
email: [email protected]

ADVISORY BOARD

E. Atkins - University of Bristol, United Kingdom
Francisco J. Balta´ Calleja - Institute for Structure of Matter, Spain
David C. Bassett - University of Reading, United Kingdom
John D. Blackwell - Case Western Reserve University, USA
R. A. Bubeck - RAB Consulting, Michigan, USA
Show-An Chen - National Tsing Hua University, Taiwan
Stephen Z. D. Cheng - University of Akronn, Ohio, USA
Michael M. Coleman - Pennsylvania State University, USA
Buckley Crist - Northwestern University, USA
Athene Donald - University of Cambridge, United Kingdom
Ulf Gedde - Royal Institute of Technology, Sweden
Benjamin S. Hsiao - State University of New York at Stony Brook, New York, USA
Richard A. L. Jones - University of Sheffield, United Kingdom
Kanji Kajiwara - Kyoto Institute of Technology, Japan
Takeshi Kikutani - Tokyo Institute of Technology, Japan
Colette Lacabanne - University Paul Sabatier, France
Frantisek Lednicky´ - Institute of Macromolecular, Chemistry, Czech Republic
Bernard A. Lotz - Institut Charles Sadron, France
R. St. J. Manley - McGill University, Montreal, Canada
Ashok Misra - Indian Institute of Technology, India
Hari Singh Nalwa - Ciba Specialty Chemicals Corporation, California, USA
R. Qian - Chinese Academy of Sciences, China
Anthony J. Ryan -  University of Sheffield, United Kingdom
Arnon Siegmann - Technion—Israel Institute of Technology, Israel
Gert Strobl - Albert Ludwigs University, Germany
M. Tsuji - Kyoto University, Japan
I. M. Ward - University of Leeds, United Kingdom
Robert J. Young - University of Manchester, United Kingdom
Giuseppe Zerbi - Polytechnic of Milan, Italy