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Nanoscience Methods Volume 3, 2014 - Issue 1
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Original Articles

Effect of coating and plasma treatments on the induced coupled plasma-reactive ionic etching of boron-doped diamond for microelectromechanical systems (MEMS) applications

Thanh Son LeInstitute of Environmental Technology, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet Road, Cau Giay District, Hanoi, VietnamCorrespondence[email protected]
,
Marc CretinInstitut Européen des Membranes, ENSCM-CNRS-Université Montpellier 2, CC047, Place Eugène Bataillon, 34095Montpellier, France
,
Patrice HuguetInstitut Européen des Membranes, ENSCM-CNRS-Université Montpellier 2, CC047, Place Eugène Bataillon, 34095Montpellier, France
,
Philippe SistatInstitut Européen des Membranes, ENSCM-CNRS-Université Montpellier 2, CC047, Place Eugène Bataillon, 34095Montpellier, France
&
Frederic PichotCentrale de Technologies en Micro et Nanoélectronique, Université Montpellier 2, Place Eugène Bataillon, 34095Montpellier, France
Pages 1-10 | Received 20 Nov 2013, Accepted 05 Dec 2013, Published online: 10 Jan 2014

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