Review of carbon nanotubes production by thermal chemical vapor deposition technique

ABSTRACT

We have reviewed carbon nanotubes (CNTs) production on a silicon wafer by thermal chemical vapor deposition (TCVD) using acetylene as a carbon source, cobalt as a catalyst and ammonia as a reactive gas. The DC-sputtering system was used to prepare cobalt thin films on Si substrates. Energy Dispersive X-ray (EDX) measurements were used to investigate the elemental composition of the Co nanocatalyst deposited on Si substrates. Atomic Force Microscopy (AFM) was used to characterize the surface topography of the Co nanocatalyst deposited on Si substrates. The as-grown CNTs were characterized under Field Emission Scanning Electron Microscopy (FESEM) to study the morphological properties of CNTs.

KEYWORDS:

• Carbon nanotubes
• cobalt nanocatalyst
• TCVD