ABSTRACT
Heterogeneous photocatalysis using nanostructured semiconductors constitutes one of the emerging advanced oxidation processes (AOP) for destructive oxidation of organic contaminants in water or air. Herein we report the kinetics of potocatalytic degradation of nitrophenols (NPs), namely, o-nitrophenol (ONP), m-nitrophenol (MNP), and p-nitrophenol (PNP), using semiconductor photocatalyst TiO2 in suspension, using laboratory-scale immersion well an ultraviolet (UV) photoreactor and the comparison of different advanced oxidation processes such as (i) UV + TiO2 (ii) UV + TiO2 + H2O2. In addition, the effect of several other parameters such as TiO2 concentration, initial concentration of substrate solution, and effect of time of irradiation was investigated to arrive at optimum process parameters for complete degradation of the pollutants. UV light was found to have a negligible effect in the absence of the photocatalyst, TiO2, whereas the percentage degradation of all three NPs was found to be drastically enhanced when H2O2 was added to the UV + TiO2 system. The degradation rate followed a first-order kinetics.
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