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Original Articles

The synthesis mechanism of complex oxide films formed in dense RF — plasma by reactive sputtering of stoichiometric targets

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Pages 75-83 | Published online: 15 Mar 2011
 

The paper presents new experimental data on the synthesis and crystallization of complex oxide films produced by rf sputtering of ceramic targets. The deposition system has threshold states, the transition through which sets off a qualitative modification of its properties. The main feature of this modification is the appearance of a new structured system in plasma.

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