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Ferroelectrics Volume 261, 2001 - Issue 1
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Session C: Relaxor ferroelectrics

The influence of processing on properties and microstructure of Bi4-xLaxTi3O12 thin films

H. X. Qin National Laboratory of Solid State Microstructure and Department of Physics, Nanjing University, Nanjing, 210093, P.R., CHINA
,
Z. H. Bao National Laboratory of Solid State Microstructure and Department of Physics, Nanjing University, Nanjing, 210093, P.R., CHINA
,
J. S. Zhu National Laboratory of Solid State Microstructure and Department of Physics, Nanjing University, Nanjing, 210093, P.R., CHINA
,
Z. Q. Jin National Laboratory of Solid State Microstructure and Department of Physics, Nanjing University, Nanjing, 210093, P.R., CHINA
&
Y. N. Wang National Laboratory of Solid State Microstructure and Department of Physics, Nanjing University, Nanjing, 210093, P.R., CHINA
Pages 59-64 | Received 03 Aug 2001, Published online: 25 Oct 2011
 
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Abstract

The Bi4-xLaxTi3O12 (x=0.75) thin films were prepared by RF magnetron sputtering and MOD techniques. The MOD-derived thin films show good ferroelectric properties and microstructure and the sputtered thin films have rougher surface and inhomogeneous microstructure.

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