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Abstract
Sub-micron period reversed domain patterns are fabricated in congruent LiNbO 3 by using electric field overpoling. Slight wet etching of the domain engineered samples in HF solution generates surface relief structures faithfully reproducing the resist pattern geometries generated by holographic lithography. Moiré holographic lithography is also used to fabricate more complicated resist templates to be transferred onto the LiNbO 3 substrates as surface structures. A wide variety of structures is presented and discussed. The preliminary results show the possibility to use the fabricated structures for the realization of photonic crystal devices such as Bragg gratings, micro-ring resonators, etc. for telecom applications.
Acknowledgments
This research was partially funded by the Ministero dell'Istruzione dell'Università e della Ricerca (MIUR) within the Fondo per gli Investimenti della Ricerca di Base project “Microdispositivi in Niobato di Litio n. RBNE01KZ94 and partially by the project MIUR n.77 DD N.1105/2002 “Circuiti fotonici integrati per le telecomunicazioni ottiche e la sensoristica” and FIRB project number RBNE01KZ94: ‘Microdispositivi in Niobato di Litio.’
