Views

CrossRef citations to date

Altmetric

Original Articles

Stoichiometric Study of the Dielectric and Magnetic Properties in Charge Frustrated System LuFe₂O₄

Takamasa Michiuchi Department of Physics, Okayama University, Okayama, 700-8530, Japan

Yusuke Yokota Department of Physics, Okayama University, Okayama, 700-8530, Japan

Takuma Komatsu Department of Physics, Okayama University, Okayama, 700-8530, Japan

Hironori Hayakawa Department of Physics, Okayama University, Okayama, 700-8530, Japan

Tomoko Kuroda Department of Physics, Okayama University, Okayama, 700-8530, Japan

Daisuke Maeda Department of Physics, Okayama University, Okayama, 700-8530, Japan

Yoji Matsuo Dept. Material Science, Osaka Prefecture University, Sakai, Osaka, 599-8531, Japan

Shigeo Mori Dept. Material Science, Osaka Prefecture University, Sakai, Osaka, 599-8531, Japan

Kenji Yoshii Synchrotron Radiation Research Center, SPring-8, Japan Atomic Energy Agency, 679-5148, Japan

Noriaki Hanasaki Department of Physics, Okayama University, Okayama, 700-8530, Japan

Takashi Kambe Department of Physics, Okayama University, Okayama, 700-8530, Japan

Naoshi Ikeda Department of Physics, Okayama University, Okayama, 700-8530, Japan

show all

Abstract

We report dielectric and magnetic properties of a single crystal of LuFe₂O₄ with different degrees of oxygen deficiency. The oxygen stoichiometry was monitored with the gas mixture ratio of CO₂ and CO during the crystal growing process. A sample having high resistivity of about 10 kΩ cm sample was found at room temperature. The relation between the control of the charge frustration and the completeness of the charge ordering is discussed.

Keywords:

Acknowledgment

This work was partially supported by grant from New Energy and Industrial Technology Development Organization.

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Order Reprints Request Corporate Permissions

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

Request Academic Permissions

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.

Stoichiometric Study of the Dielectric and Magnetic Properties in Charge Frustrated System LuFe₂O₄

Related Research Data

Information for

Open access

Opportunities

Help and information

Stoichiometric Study of the Dielectric and Magnetic Properties in Charge Frustrated System LuFe2O4

Abstract

Acknowledgment

Reprints and Corporate Permissions

Academic Permissions

Related Research Data

Related research

To cite this article:

Download citation

Information for

Open access

Opportunities

Help and information

Keep up to date

Your download is now in progress and you may close this window

Login or register to access this feature

Stoichiometric Study of the Dielectric and Magnetic Properties in Charge Frustrated System LuFe₂O₄