ABSTRACT
Surface passivation is an effective way to eliminate the surface states and to improve the optical properties of GaAs. Moreover, carriers restriction of wide bandgap materials also is a path to enhance photoluminescence. In this paper, Be-doped GaAs epilayer was growth on GaAs substrate by molecular beam epitaxy. The MgO films were deposited by atom layer deposition. It was used as not only passivation layer to eliminate surface states, but also barrier layer to restrict carriers. The carriers restriction was confirmed by photoluminescence and current-voltage characteristics of metal-insulator-semiconductor structure. As the result, the photoluminescence intensity of Be-doped GaAs with 5 nm MgO was 2.5 times higher than the bare Be-doped GaAs.
KEYWORDS: