Fabrication of BaTiO₃ films by RF planar-magnetron sputtering

Abstract

BaTiO₃ films have been fabricated onto platinum and fused-quartz substrates by rf planar-magnetron sputtering using BaTiO₃ ceramic target. For the substrate temperatures above 500 °C, the films have the perovskite structure. Preferential orientations, grain sizes and lattice constants of these films vary with the substrate temperatures and gas pressures. Ferroelectric properties are observed for BaTiO₃ films fabricated at the substrate temperature of 700 °C and the gas pressures above 10⁻² Torr.