PLZT films are prepared by r f diode sputtering from a target, eight inches in diameter, manufactured by hot pressing of ceramic powder. The parameters of this process, e.g. gas pressure, substrate bias, power and excess PbO built into the target, have a great influence on the stoichiometry of the films. Substrate temperatures above 500°C during the process are necessary to obtain perovskite ferroelectric films in situ. A thermal annealing destroys the surface of the films and they can no longer be used for optical application. The ferroelectric behaviour is examined by dielectric measurements versus temperature and frequency and by studies of hysteresis loops respectively. The results are compared with the values of ceramics. The longitudinal electro-optic effect of the films is measured in transmission.
Preparation and properties of thin ferroelectric films of PLZT
Reprints and Corporate Permissions
Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?
To request a reprint or corporate permissions for this article, please click on the relevant link below:
Academic Permissions
Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?
Obtain permissions instantly via Rightslink by clicking on the button below:
If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.
Related research
People also read lists articles that other readers of this article have read.
Recommended articles lists articles that we recommend and is powered by our AI driven recommendation engine.
Cited by lists all citing articles based on Crossref citations.
Articles with the Crossref icon will open in a new tab.