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Abstract
Polycrystalline and epitaxial films of PbTiO3, Pb(Zr, Ti)O3, and Pb2KNb5O15 in perovskite and tungsten-bronze phases have been fabricated on the glass, platinum and sapphire substrates by rf planar magnetron sputtering, using ceramic targets. The substrate temperature higher than 530°C is necessary to grow PbTiO3 films in the perovskite phase without post thermal annealing. Pb(Zr, Ti)O3 and Pb2KNb5O15 films in the pyrochlore phase grown at the substrate temperature lower than 500°C and 650°C, respectively change their phases to the perovskite and to the tungsten-bronze by post thermal annealing.
