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Ferroelectrics Volume 93, 1989 - Issue 1
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Thin films

Deposition of new piezoelectric Ta2O5 thin films and their surface acoustic wave properties

Y. Nakagawa Faculty of Engineering, Yamanashi University, Takeda-4, Kofu, 400, Japan
Pages 13-20 | Received 29 Aug 1988, Published online: 10 Feb 2011
 
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Abstract

A new technique for the deposition of the crystalized Ta2O5 thin films by using the reactive dc diode sputtering is described. Crystallized structure, piezoelectric properties and the material constants of this new film were investigated.

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