Deposition process effect on crystalline structure of (Pb, La) TiO₃ thin films by multi – ion – beam reactive cosputtering technique

Abstract

Multi—ion—beam reactive cosputtering (MIBRECS) technique is a promising technique for preparing multi—component oxide thin films. However, the deposition processes are critically important for preparing thin films with prospected stoichiometry and good quality. In this paper, the effect of deposition processes, such as substrate temperature, ion beam energy and current, and the postdeposition annealing conditions on the composition and crystalline structure of (Pb, La) TiO₃ ferroelectric thin films prepared by MIBRECS technique are reported.