Abstract
PbTiO3 thin films were prepared on conductive oxide substrates by coevaporation of lead and titanium. When PbTiO3 was deposited on a sputtered Pt film, the chemical composition of deposited film was changed (Pb deficient) and the crystal structure was that of PbPtx. On the contrary, a perovskite phase of PbTiO3 was obtained without post thermal annealing on a sputtered 1% Te-added indium tin oxide substrate. The substrate temperature was 550°C and the deposition rate was greater than 50 nm/min, which was much larger than that by the sputtering method.