A Probabilistic Method for Evaluating Primary Current Distribution in Electrodeposition Cells

Summary

A probabilistic method is presented for determination of primary current density profiles in electrodeposition cells. It is shown that the current distribution at the cathode can be determined from the simple relationship: where r_i, is the proportion of the total trials that result in particles terminating at the anode equipotential boundary and m is the number of points considered in the distribution. The usefulness of the method as a tool to help predict the effect of shielding using baffles in chromium plating cells is explored by comparing computed and experimental thickness profiles.