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Physical electronics

Field effect studies on metal-insulator-semiconductor structures of laser annealed n-type Pb0.8Sn0.2Te epitaxial thin films

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Pages 691-705 | Received 15 Oct 1986, Accepted 20 Oct 1986, Published online: 24 Feb 2007
 

Abstract

Pb0.8Sn0.2Te thin films grown by flash-evaporation were irradiated with Nd : YAG laser pulses of various energy densities (2-30 mJ/cm2). Metal-insulator-semiconductor (MIS) structures were fabricated by growing metal contacts on the other side of the substrate. DC conductivity and Hall coefficient studies were made in the temperature range 77-400 K at various gate fields for as-grown as well as laser annealed films. Total charge induced at the interface, effective field effect mobility, the values of excess charge in the space charge region have been calculated.

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