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Abstract
Extreme ultraviolet (EUV), 13.5 nm, lithography techniques have attracted a great deal of attention because of the mass production of 50 nm critical dimensions as the future generation lithography. One of key issues to be clarified for the development of a 13.5 nm EUV light source is to improve the conversion efficiency (CE). In this paper, hollow multilayer nanofibers were fabricated through the combination of a layer-by-layer (LBL) technique with the electrospinning technique. The obtained hollow fibers were employed as EUV targets. In order to improve the CE, the irradiated laser energy was increased from 1010 to 1011 W/cm2 and the CE was correspondingly increased from 0.43 to 0.83%.
Acknowledgments
This work was performed under the auspices of Ministry of Education, Culture, Science, and Technology, Japan under contract subject “Leading project for EUV lithography source development”; It was partly supported by the JSPS-CAS core-university program in the field of “plasma and nuclear fusion”. Liqin Ge thanks the Excellent Young Teacher Supporting Program for Teaching and Researching from Southeast University, Nanjing, China for their financial support.
