A Simplified Method for Making Accurately Etched Shapes in Molybdenum Foils by a Photo Sensitive Resist Technique

Abstract

Photo etching is a convenient technique for fabricating small metal components, but normally expensive and complex equipment is needed. This report describes a simplified technique for making evaporation masks in molybdenum foil, using standard laboratory equipment of relatively low cost. When using 0.003 in. molybdenum results accurate to ±0.0005 in. (±3 per cent) have been achieved. Accuracy is dependent on a number of factors, which include the photography, the thickness and type of metal and the etching technique.