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Abstract
The sensitization of a photographic silver-halide emulsion is intimately connected with the micro-structure of the solid phase. This paper summarizes and discusses the knowledge gained during recent years, in particular the work of the author and his collaborators. Chemical sensitization is studied as a surface phenomenon. The importance of intrinsic lattice defects and impurity centres for photographic sensitivity is evaluated. The relation between chemical sensitization and the formation of fog is then discussed. A survey of the sources of chemical sensitization in the ripening of emulsions is followed by a comparison of the characteristics of ripening and photolysis and a discussion of the stability of impurity centres and latent-image centres. Finally an attempt is made at summarizing the lows which can be observed in the phenomena of chemical sensitization.
Notes
Translated from the Russian by S.C. Goddard. Kodak Research Laboratories, Harrow, Middlesex.