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Original Articles

Sensitized Photolysis on Semiconductors and the Structure of the Latent ImageFootnote*

, , &
Pages 61-64 | Received 17 Oct 1977, Published online: 22 Jul 2016
 

Abstract

The illumination of semiconductor in the intrinsic region of photosensitivity results in a reduction of silver ions adsorbed on the surface of the semiconductor. After this, the latent image can be developed by physical developers. By scanning electron microscopy the nature of the latent image centres is investigated.

Résumé

L’éclairement d’un semi-conducteur dans la région de sa photosensibilité intrinsèque provoque la réduction des ions argent adsorbés à sa surface. L’image latente ainsi formée peut être développée par développement physique. La nature des germes d’image latente est étudiée au moyend’un microscope électronique à balayage.

Zusammenfassung

Durch Belichtung eines Halbleiters im Bereich seiner Eigenabsorption lassen sich an der Oberfläche adsorbierte Silberionen reduzieren. Anschliessend kann das latente Bild durch Entwicklung verstärkt werden. Die Natur der Latentbildkeime wird mit Hilfe eines Raster-Elektronen- mikroskopes untersucht.

Riassunto

L’esposizione del semiconduttore nella regione intrinseca di fotosensibilità dà luogo alla riduzione degli ioni argento adsorbiti sulla superficie del semiconduttore. A questo punto l’immagine latente può essere rivelata con uno sviluppo fìsico. Tramite elettromicroscopia a scansione viene studiata la natura dei centri di immagine latente.

Notes

* Dedicated to Professor W. F. Berg for the 70th anniversary of his birthday (31 March 1978).

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