Quantitative Examination of Photofabricated Profiles. Part 3. Measurement of Etch Factor

Some authors have used the inverse function (undercut/depth) but the form chosen here has the logical advantage of high etch factors indicating good performance.

Abstract

Although “etch factor” is a basic concept in photomechanical systems, no detailed examination of the problems of its determination is known to the authors in the open (unrestricted) literature. This paper aims to fill that void and also defines a new parameter named Bar Etch Factor.

Notes

Some authors have used the inverse function (undercut/depth) but the form chosen here has the logical advantage of high etch factors indicating good performance.