1
Views
0
CrossRef citations to date
0
Altmetric
Articles

Exposure Reciprocity in Screenless Positive Plate Lithography

& (Fellow)
Pages 109-111 | Received 17 Sep 1984, Published online: 16 Nov 2018
 

ABSTRACT

Although the theory and earlier studies of screenless photo-lithography have suggested that reciprocity exists in respect of the light intensity and the duration of the exposure of the printing plate when sensitised with quinone diazide ester, the work relates to a purpose designed test. The results establish that reciprocity prevails over at least a six fold range of intensity or of duration. The supplementary evidence given suggests that good agreement occurs when as much as a 25 times variation in intensity and duration occurs.

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.