Inspection of Integrated Circuit Photomasks using Optical Data Processing Techniques

Paper presented at a conference organized jointly by the Holography Group of The Royal Photographic Society and the Central Electricity Generating Board entitled “Holographic Measurement, Speckle and Allied Phenomena” held at the CEGB Headquarters in London on 16-17 April 1985.

Abstract

The application of optical signal processing techniques for the inspection of integrated circuit photomasks, could prove to be a fast and cheap means of photomask inspection. In this paper we discuss two possible optical inspection techniques and their suitability for use as a practical inspection tool.

Notes

Paper presented at a conference organized jointly by the Holography Group of The Royal Photographic Society and the Central Electricity Generating Board entitled “Holographic Measurement, Speckle and Allied Phenomena” held at the CEGB Headquarters in London on 16-17 April 1985.