The Threshold Sensitivity of AgHal-Emulsions

Abstract

The problem of a minimal quantum exposure, defining the threshold sensitivity of AgHal-emulsions, has been discussed. On the grounds of the simple statistical considerations it is shown that the proper estimate of the minimal exposure cannot be given without due regard to the inclination of emulsion microcrystals to spontaneous development leading to photographic fog. The idea of an allowable fog level, making the reducing sensitization quite feeble, was introduced. The discussion has been accomplished within the limits of the Gumey-Mott theory.