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Abstract
The response of evaporated layers of pure and doped AgBr to irradiation with soft A1 Kα X-rays (λ = 8.34 Å) is studied. The gamma values and maximum density are determined at various accelerating voltages. The layers’ sensitivity is by 3 to 5 orders of magnitude higher than that of commercial resists used in X-ray lithography. The distribution of latent image centres in the bulk of AgBr microcrystals is similar to that in the case of exposure to visible light. A qualitative estimation of the possibilities for reproduction of microstructures by X-rays is given.