1
Views
0
CrossRef citations to date
0
Altmetric
Original Articles

A Discussion on Problems Concerning the Lith Effect and Development Pattern

, &
Pages 28-32 | Received 24 Mar 1990, Published online: 21 Jul 2016
 

Abstract

Factors determining the pattern of grain development, either in parallel or sequential, are discussed both for image development and fog formation. Lith development, as a typical example of parallel grain development, is discussed in more detail.

That development may proceed with either parallel or sequential grain reduction is not merely an experimental phenomenon, the different modes lead to different patterns of density growth. Only when grains develop in parallel can the rate of density growth give information about the rate at which a single grain develops. The relationship of high contrast to parallel development is indicated by considering the similar kinetics shown by lith, parallel, and single-grain development.

A phenomenon occuring in the induction period is presented to explain the dependence of the induction period on exposure, which is required for producing the lith effect.

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.