A Facile Preparation of Aromatic Anion Radicals by Ultrasound Irradiation

T. Azuma Department of Chemical Process Engineering, Faculty of Engineering, Osaka University, Suita, Osaka, Japan, 565

S. Yanagida Department of Chemical Process Engineering, Faculty of Engineering, Osaka University, Suita, Osaka, Japan, 565

H. Sakurai Department of Chemical Process Engineering, Faculty of Engineering, Osaka University, Suita, Osaka, Japan, 565

S. Sasa Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka, Japan

K. Yoshino Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka, Japan

Abstract

Aromatic compounds such as naphthalene and biphenyl are reduced by alkali metals, giving armatic anion radicals which are useful as strong bases in organic synthesis,¹ as initiators of polymerization² and oligomerization,³ and also as a medium for n-type doping in organic semiconductor like (CH)_X.⁴ Howerver, preparation of such reagents requires anhydrous and oxygen free reaction conditions, use of carefully dried solvent being requisite for the success of the reaction. In addition, long inductin time is often observedwhen alkail metal cuts are used. Thus, employment of evaporated alkali metal film or finely dispersed metal alkali was generally recommended.⁵.

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A Facile Preparation of Aromatic Anion Radicals by Ultrasound Irradiation

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A Facile Preparation of Aromatic Anion Radicals by Ultrasound Irradiation

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