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Abstract
Two strains of mice were selected for resistance (DBA/2) or susceptibility (C3H/HeN) to contact dermatitis. Benzo[a]pyrene-DNA adduct formations was compared in the two mouse strains by a postlabeling procedure to determine if there was a significant effect. Results showed that adduct profiles in DBA/2 and C3H/HeN dermis were qualitatively similar. The total binding levels were higher in DBA/2 mice on the d 2 and the d 10. DNA adduct formation has been shown to inversely correlate with skin allergy induction. Data suggest that the expression of the genes responsible for the differences in responsiveness to chemical induced contact dermatitis in mouse may play an important role in benzo[a]pyrene-DNA adduct formation.