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Original Articles

Strain relaxation by edge dislocations in GaAs/GaAlAs double heterostructures

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Pages 779-786 | Received 16 Apr 1993, Accepted 18 Oct 1993, Published online: 27 Sep 2006
 

Abstract

Misfit dislocations have been observed in some AlGaAs/GaAs/AlGaAs thick double-heterostructures grown by molecular beam epitaxy, and analysed using X-ray reflection topography. In some cases, only pure edge segments have been observed in a particular 〈110〉 direction parallel to the interface plane. These observations emphasize the role of dislocation sources for strain relaxation. A model of edge dislocation formation is proposed, based on the existence of particular sources located at an interface and able to generate simultaneously two dislocation half-loops in two different {111} glide planes.

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