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Original Articles

Effects of elastic relaxation on large-angle convergent-beam electron diffraction from cross-sectional specimens of GexSi1−x/Si strained-layer superlattices

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Pages 1091-1105 | Received 14 Jun 1994, Accepted 20 Jun 1994, Published online: 27 Sep 2006
 

Abstract

A large-angle convergent-beam electron diffraction pattern with fine diffraction lines from a cross-sectional specimen of Gexsi1−x/Si strained-layer superlattices can give much information on local strain and misfit stress relaxation. The diffraction lines in the GeSi layers are shifted from those in the Si layers by the misfit strain and the strain relaxation. In this paper we shall demonstrate that the effects of elastic relaxation and the residual strains can be separated.

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