Abstract
The diffusion characteristics of Pd in amorphous films of Pd-Ta metallic alloys deposited onto Si have been investigated by transmission electron microscopy. The present study is based on our previous investigation of (Pd-Ta)/Si solid-state reactions where a Pd diffusion model was proposed.
The amorphous film starts to crystallize at the interface with the substrate. Measurements of the thicknesses of the amorphous layer made on cross-sections allows estimates of diffusion coefficients and the activation energies for diffusion and relaxation. The results verify the model proposed earlier for diffusion in thin films of metallic glasses on Si.