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Original Articles

Impurity levels in phosphorus- and boron-doped amorphous silicon

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Pages 281-285 | Accepted 11 Mar 1997, Published online: 27 Sep 2006
 

Abstract

The AMI semiempirical quantum-chemical method has been used to investigate phosphorus and boron-doped amorphous silicon. A simple relationship for the determination of midgap energy levels is proposed for substitutionally doped amorphous silicon as a function of distances between dopants.

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