Generation of Ni–Si₃N₄ nanocomposites by DC, PC and PRC electrodeposition methods

Abstract

Ni–Si₃N₄ nanocomposite thin films were fabricated by direct current (DC), Pulse current (PC) and Pulse reverse current (PRC) electrodeposition methods. The structure and surface morphology of thin films were analysed by XRD, Scanning Electron Microscopy and Atomic Force Microscope. Corrosion protection performance of the Ni–Si₃N₄ nanocomposite on mild steel in 3.5% NaCl corrosive medium was assessed by electrochemical method. Texture coefficient and microhardness of the thin films were determined and discussed. Comparisons and performance of corrosion resistance of these coatings obtained by DC electrodeposition, PC electrodeposition and with PRC electrodeposition were investigated.

Keywords:

• Nanocomposites
• SEM
• Si₃N₄
• Electrochemical impedance
• Pulse reverse plating

Acknowledgements

The authors thank the Department of Science and Technology, New Delhi, Govt. of India under the fast track scheme for young scientist [DST: Project Sanction No. SR/FT/CS-147/2011 dated 13-07-2012] for providing instrumental and financial facilities. The authors are also grateful to the authorities of the Srinivas School of Engineering, Mukka, Mangalore, Karnataka, India, for providing lab facilities.