All-organic Poly(butyl methacrylate)/Poly(vinylidenefluoride-trifluoroethylene) Dielectric Composites with Higher Permittivity and Low Dielectric Loss for Energy Storage Application

ABSTRACT

With the rapid development of electronic industry and technology, there are increasingly stringent requirements on dielectric materials with higher permittivity, lower loss, and enhanced breakdown field. Since single dielectric material cannot meet the demands of industrialization, polymer-based dielectric materials with better quality have been widely applied. This study focused on a poly(butyl methacrylate/poly(vinylidene fluoride-trifluoroethylene) dielectric composite thin film, which were prepared by solution casting method. X-ray diffraction and differential scanning calorimetry data indicated that introducing poly(butyl methacrylate) led to increase in the crystallinity. The result of scanning electron microscopy showed the good compatibility between poly(vinylidene fluoride-trifluoroethylene) and poly(butyl methacrylate). Besides, the dielectric film remained good mechanical property. The dielectric properties were studied as a function of filler content and frequency. The results showed that the permittivity was as high as 13.3, while the breakdown field was 322 MV m⁻¹ when the fraction of poly(butyl methacrylate) was 10%. Blending poly(butyl methacrylate) improved the dielectric performance of the poly(vinylidene fluoride-trifluoroethylene).

GRAPHICAL ABSTRACT

KEYWORDS:

• Breakdown field
• dielectric permittivity
• loss tangent
• poly(n-butyl methacrylate)
• polymer matrix

Acknowledgments

The authors gratefully acknowledge by National High Technology Research and Development Program of China (No. 2011AA11A273), National Natural Science Foundation of China (No. 21476020).