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Original Articles

Development of a Monte Carlo Simulation Suite for Predicting the Electron Beam Interaction with Resist on Semiconductor Substrates

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Pages 301-309 | Published online: 26 Mar 2015
 

Abstract

In this paper, an indigenously developed computer program suite, based on Monte Carlo simulation, is presented to simulate and understand the electron beam interaction with resist and substrates. Using this program, for different energies, one can determine the path of the electrons in the solid, which consists of either a single layer or multiple layers and also calculate the energy loss of the electrons in the resist and the substrate. We have used the Rutherford model for electron scattering and the Bethe's continuous slowing down approximation for estimating the electron energy loss. In this model, the mean free path length of the electron is the key parameter for calculating the scattering cross sections of single and multiple layers. Using our program, we have studied the electron interactions on Si and GaAs substrates with polymethyl Methylacrylate (PMMA) as resist and are able to calculate the extent of electron backscattering and also the depth of penetration for different incident electron energies.

Additional information

Notes on contributors

M Shubhakanta Singh

M Shubhakanta Singh cpmpleted his MSc (Physics) from Jamia Millia Islamia in 1996 and Advanced Post Graduate Diploma in Computer Application in 2000.

From 2000 to 2002 he was in Solid State Physics Laboratory. During that time he designed simulation softwares for MMIC design and Modelling and Electron beam Lithography. Since 2002, he has been working as a Project Associate at Electrical Engineering Department, IIT Delhi with Prof Jagadesh Kumar on a project entitled “Simulation of energetic electron beam interaction with resist on the semiconductor substrates using Monte Carlo process and its application to e-beam lithography in collaboration with Solid State Physics Laboratory, Defence Research and Development Organization, Timarpur, New Delhi.

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