Study of semiconductor lasers under simultaneous uniaxial stress and hydrostatic pressure

H. D. Hochheimer Department of Physics, Colorado State University, Fort Collins, CO, 80524, USA

F. Widulle Department of Physics, Colorado State University, Fort Collins, CO, 80524, USA

J. Th. Held Department of Physics, Colorado State University, Fort Collins, CO, 80524, USA

G. Strehl Department of Physics, Colorado State University, Fort Collins, CO, 80524, USA

R. T. Kotitschke Department of Physics, University of Surrey, Guildford, GU2 5XH, United Kingdom

A. R. Adams Department of Physics, University of Surrey, Guildford, GU2 5XH, United Kingdom

Abstract

We present the design of a device for the simultaneous application of uniaxial stress and hydrostatic pressure. This new apparatus will for the first time allow measurements at constant strain. Results of the simultaneous application of uniaxial stress and hydrostatic pressure to a semiconductor laser are presented and discussed.

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Study of semiconductor lasers under simultaneous uniaxial stress and hydrostatic pressure

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Study of semiconductor lasers under simultaneous uniaxial stress and hydrostatic pressure

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