Technique of light-assisted polishing of quartz surface covered with sodium hypochlorite solution: electrodynamical analysis

ABSTRACT

Analysis of electrodynamic conditions of new photo-assisted nanoscale polishing method is presented. The proposed method implements subnano-polishing of quartz surface covered with sodium hypochlorite solution when the lighting from the quartz side and the total internal reflection are taken place. It was found that for a quartz surface profile the optimal conditions for photochemical polishing are achieved when the angle of light incidence is critical and the standard deviation of the quartz surface height is small (up to 10 nm). In this case, the evanescent wave, which propagates along the quartz surface, creates a greater amplitude of field energy oscillations in the region of surface protrusions than in the region of troughs. At the same time, the electrodynamic solution is essentially independent of the light wavelength and the field contrast above the quartz surface is decreased, when the length of the correlation of the rough surface profile is increased.

KEYWORDS:

• Photochemical polishing
• scattering of plane electromagnetic waves
• vector Helmholtz equation
• surface roughness
• total internal reflection

PACS Nos:

• 13.40.−f
• 41.20.Jb
• 42.25.−p
• 42.62.Cf
• 68.35.Ct

Disclosure statement

No potential conflict of interest was reported by the author(s).

ORCID

V. I. Kanevskii http://orcid.org/0000-0003-0151-8023

S. O. Kolienov http://orcid.org/0000-0001-5408-1983