We have observed that pulsed subbandgap illumination creates dangling bonds with a density of about 10 18 cm m 3 in high-quality hydrogenated amorphous silicon films. Such a light-induced creation of dangling bonds can be accounted for in terms of a model in which self-trapping of holes in weak Si-Si bonds adjacent to a Si-H bond plays an important role. The kinetics of thermal annealing of the light-induced dangling bonds have been examined, in which half of the defects are annealed out at temperatures above 180C, but half of them remain.
Light-induced defect creation under pulsed subbandgap illumination in hydrogenated amorphous silicon
Reprints and Corporate Permissions
Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?
To request a reprint or corporate permissions for this article, please click on the relevant link below:
Academic Permissions
Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?
Obtain permissions instantly via Rightslink by clicking on the button below:
If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.
Related research
People also read lists articles that other readers of this article have read.
Recommended articles lists articles that we recommend and is powered by our AI driven recommendation engine.
Cited by lists all citing articles based on Crossref citations.
Articles with the Crossref icon will open in a new tab.