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Original Articles

Gold silicide precipitates in silicon

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Pages 75-80 | Received 10 Nov 1987, Accepted 12 Nov 1987, Published online: 20 Aug 2006
 

Abstract

This Letter describes the precipitation of gold in silicon from a highly supersaturated solution. After saturation of float-zone Si at 1275°C with gold, annealing experiments were performed at 850°C for various annealing times. By means of high-resolution electron microscopy, small particles (10–20 nm diameter) consisting of a metastable gold silicide were found. From selected-area diffraction patterns we deduce an orthorhombic unit cell with a = 0·960, b = 0·768 and c = 0·690 nm.

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