151
Views
33
CrossRef citations to date
0
Altmetric
Original Articles

Characteristics of Fe2+/H2O2/UV Oxidization Process

Pages 183-191 | Published online: 11 May 2010
 

Abstract

The characteristics of a Fe2+/H2O2/UV system, which was constructed by introducing UV irradiation (wave length 253.7 nm) into a Fenton oxidization system, were evaluated on decomposition of pyridine and other organics. The effect of oxygen on organic decomposition was also examined by feeding air into the reactor. The optimum Fe2+ concentrations for pyridine and acetic acid were found to be 45.6 and 9.1 mg l−1, respectively, under the conditions of 250 mgTOC l−1, 2450 mgH2O2 l−1, and 35°C. On the other hand, there existed no optimum H2O2 concentration for pyridine decomposition in the range of 550 mg l−1 to 2450 mg l−1. Aeration was found to be an effective method to increase the TOC removal efficiency. The reaction rate was increased by increasing the reaction temperature. Of the 15 compounds investigated in this study, organics with high electron density, such as aromatic and heterocyclic compounds were relatively easy to decompose, compared with the aliphatic compounds such as alcohols, ketones, and organic acids. The relatively low decomposition rates of alcohols and ketones were originated from the formation of acetic acid. Nitromethane was difficult to be completely decomposed by the Fe2+/H2O2/UV system.

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.