177
Views
4
CrossRef citations to date
0
Altmetric
Original Articles

Microstructural and Tribological Behavior of Pulse Electroplated Nickel Barrier on Copper Conductors

ORCID Icon & ORCID Icon
Pages 476-485 | Received 17 Jul 2018, Accepted 20 Jan 2019, Published online: 09 Apr 2019
 

Abstract

The microstructural, mechanical, and tribological behaviors of electroplated Ni on Cu conducting substrates have been investigated in this study. The microstructural studies were performed by X-ray diffraction (XRD) analysis and scanning electron microscopy (SEM). The results showed that initially (111) with (220), (200) Ni texture components were predominant in the coating, and increasing the current density from 0.1 to 0.5 A/cm2 led to the development of a strong (111) texture. The presence of ultrafine grains coupled with a (111) Ni texture improved the coating microhardness and wear properties significantly. It was shown that with an increase in current density, wear resistance of the coatings improved significantly and the electrical resistivity increased due to the highly populated grain boundaries.

Additional information

Funding

This research was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (NRF-2018R1D1A1B07044481) to B.A. and (NRF-2018R1D1A1B07044706) to A.S.

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.