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Abstract
X-ray lithography is an important technique in microfabrication used to obtain structures and devices with a high aspect ratio. In this study, we develop a three-dimensional numerical method for obtaining the steady state temperature profile in an X-ray irradiation process by using a hybrid finite element-finite difference scheme and a preconditioned Richardson method for the Poisson equation at the microscale. A domain decomposition algorithm is then obtained based on a parallel Gaussian elimination for solving block tridiagonal linear systems. Numerical results show that such a method is efficient.
Notes
Address correspondence to Dr. Weizhong Dai, Department of Mathematics and Statistics, Louisiana Tech. University, Ruston, LA 71272, USA.