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Radiation Effects and Defects in Solids
Incorporating Plasma Science and Plasma Technology
Volume 169, 2014 - Issue 3
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Original Articles

Deposition of SiOx layer by plasma-enhanced chemical vapor deposition for the protection of silver (Ag) surfaces

Saad Al TaraziUniversity of Milano Bicocca, Dipartimento di Fisica “G.Occhinalini”, Piazza della Scienza 3. Milano, Italy
,
Luca VolpeUniversity of Milano Bicocca, Dipartimento di Fisica “G.Occhinalini”, Piazza della Scienza 3. Milano, Italy
,
Luca AntonelliUniversity of Milano Bicocca, Dipartimento di Fisica “G.Occhinalini”, Piazza della Scienza 3. Milano, Italy
,
Rashida JaferUniversity of Milano Bicocca, Dipartimento di Fisica “G.Occhinalini”, Piazza della Scienza 3. Milano, Italy
,
Dimitri BataniUniversité Bordeaux, CNRS, CEA, CELIA (Centre Lasers Intenses et Applications), UMR 5107, Talence, FranceCorrespondence[email protected]
,
Antonio d'Esposito Kolzer, Via Francia 4, 20093Cologno Monzese Milano, Italy
&
Marialuisa VitobelloEuropean Jewelry Technology Network, EJTN-GEIE, Via San Pedrino 19 I-20067 Paullo, MI, Italy
 show all
Pages 217-224 | Received 07 May 2013, Accepted 15 Oct 2013, Published online: 24 Jan 2014
 
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Abstract

Silver surfaces have been treated with plasma-enhanced chemical vapor deposition to produce SiO2-like coatings for possible applications in the jewelry industry. Different experimental conditions have been tested in order to optimize the protective effectiveness of the deposited layers. Samples were analyzed with optical and scanning electron microscopy and energy-dispersive spectrometry.

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