Optical emission spectroscopy of the sputtering process in the triode system

Abstract

The results of spectroscopic investigation of plane plasma discharge and sputtering processes in the triode system are presented. The forced electric discharge with currents of 1–4 A at an argon pressure of 1 mTorr was studied using the emission spectroscopy method. The spectra of plasma discharge were observed in the 200–1100 nm wavelength range. Two metal targets, gold and silver, were used for sputtering. It was found that a part of sputtered particles is ionized in plasma. The emission spectra of the ionized gold and silver species were observed as a function of target voltage while sputtering. It was shown that the number of ionized metal species depends on the energy of argon ions.

Keywords:

• triode plasma sputtering
• optical emission spectroscopy
• gold and silver deposition