Fractional ionization in plasmas produced by pulsed laser ablation

A pulsed infrared laser (Q-switched Nd:Yag) is employed to irradiate different metal targets having atomic number from Z =13 up to Z =82. The high laser fluence deposited on the metals, of the order of 100 v J/cm, produces high ablation yield and a plasma generation at the target surface. The emitted species are neutral and ionized atoms. Both components have been investigated in terms of yield emission, time-of-flight measurements and angular distribution. Results indicate that the main emission occurs mainly along the normal to the target surface, that the etching, at high fluence, is of the order of 10 v atoms/ pulse, that the atoms velocities are of the order of 10 v m/s, that the maximum ion energies are of the order of keV. During the laser irradiation, expanding and non-equilibrium plasma is produced in front of the target. The plasma has a fraction ionization depending by the metal species and generally within 10% and 80%. The plasma'temperature, at high fluence, can be theoretically calculated and reaches about 10 v K. The fractional ionization of the plasma, experimentally measured, has been investigated as a function of the laser fluence and of the energy binding of the target molecules. The ion emission yield is presented and discussed in view of the possibility to realize a laser ion source for ion accelerators.

Keywords:

• Fractional Ionization
• Pulsed Laser Ablation
• Plasma Generation