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Radiation Effects and Defects in Solids
Incorporating Plasma Science and Plasma Technology
Volume 132, 1994 - Issue 4
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Section B: Crystal lattice defects and amorphous materials

Diode parameter determination as applied to mosfets for radiation effects characterization

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Pages 355-360 | Received 21 Jun 1994, Published online: 19 Aug 2006
 

Abstract

An experimental study of the drain-substrate junction controlled by gate voltage has been carried out on n-MOSFETs. The experimental procedure to acquire the current-voltage characteristics is described together with a theoretical analysis that leads to extract electrical and structural parameters for a description of carrier transport phenomena. The determination of junction parameters is shown to be a powerful method for the evaluation of radiation degradations of the performances of the devices.

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