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A simple and mild procedure for the trimethylsilylation of a wide variety of phenols with hexamethyldisilazane (HMDS) on the surface of silica gel dispersed with NaHSO4 at r.t. in a few minutes with excellent yields under neutral conditions is reported. This procedure also allows an excellent selectivity for the silylation of phenols in the presence of amine and CO2H groups.
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