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Articles

Assessment of Extremely Low Frequency (ELF) Electric and Magnetic Fields in Microelectronics Fabrication Rooms

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Pages 777-784 | Received 26 Sep 1990, Accepted 22 Mar 1991, Published online: 24 Feb 2011
 

Abstract

Extremely low frequency (ELF) magnetic and electric fields were measured in four microelectronics fabrication rooms that utilized a variety of electrical devices. Magnetic field levels measured in the aisles of the workrooms ranged from 0.2 to 7.0 mG; electric field levels ranged from 0.1 to 5.0 V/m. At 2 inches from the surfaces of various workroom devices, magnetic field levels ranged from 5 to 400 mG; at 2 feet from the device surfaces, levels ranged from 0.5 to 70 mG. From the measured levels and information obtained on typical work patterns, 8-hour time-weighted average personal exposures were estimated for various work scenarios.

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