Chemical solution technique to prepare perovskite PZT and PLZT thin films and powders

Abstract

PbZr_0.65Ti_0.35O₃ and Pb_0.91La_0.09Zr_0.65Ti_0.35O₃ thin films with thickness of around 100 nm were prepared by the chemical solution deposition technique on Si (100) substrate. Complex metal alkoxide precursors were synthesized by alcoholisis and alcohol exchange reactions starting from metallorganics compounds. NMR spectroscopic techniques, ¹H and ¹³C, and FTIR analysis were used to study the arrangement of the metals and oxygen in the precursor molecules. The films were deposited on Si (100) by spin coating technique and thermal treated by Rapid Thermal Processing for film crystallization. The thermal evolution and structural characterization were performed by DTA-TG/FTIR and by glazing incidence XRD and XRD powder. A PLZT powder with a well-crystallized perovskite structure was obtained at 700°C free of pyrochlore phase whereas the PLZT film exhibits a distorted perovskite structure and residual pyrochlore. The PZT films were less crystallized. The silicon substrate affects the crystal structure of the film. The residual acetylacetonate groups in the precursor of PLZT, would reduce the clustering of Zirconium species.

Key Words:

• CSD
• thin films
• PZT
• PLZT